CDE ResMap Chosen by ISMI to Support 450mm Process Development

CDE ResMap Chosen by ISMI to Support 450mm Process Development
CUPERTINO, Calif. – Creative Design Engineering (CDE) announced that the 450mm Program at International SEMATECH Manufacturing Initiative (ISMI) has selected CDE’s ResMap 575, a four-point probe resistivity mapping system. The system will be one of ISMI’s first metrology tools for 450mm equipment and process development. The ResMap 575 can support bulk silicon and conductive film development efforts.
Dr. David Cheng, VP of Engineering at CDE, said, “We are pleased and excited to be chosen to supply the ResMap 575 to support such an important industry transition. This decision is in keeping with CDE’s history, as we developed and delivered the industry’s first 300mm four-point probes.”
“CDE’s four-point probe tool will be an important step forward in providing metrology capabilities for suppliers in their 450mm tool and process development efforts,” said Tom Abell, ISMI’s 450mm Senior Advisor and Test Wafer Generation Project Manager. “We are very pleased that CDE will be participating in our program and in our supplier enabling role for a cost-effective transition.”
Creative Design Engineering has installed more than 500 CDE ResMap systems worldwide, supporting high-capacity IC processes as well as numerous research and development laboratories. The solar line of ResMap systems extends the application of high-performance metrology which CDE’s customers have come to expect for automatic resistivity mapping.
International SEMATECH Manufacturing Initiative (ISMI) is a wholly owned subsidiary of SEMATECH, dedicated to reducing cost per wafer and ultimately cost per die, through cooperative programs focused on manufacturing effectiveness. As part of ISMI's portfolio of programs, ISMI is building the infrastructure for the transition to 450mm. The ISMI 450mm program is committed to enabling a cost-effective transition through coordination and development of infrastructure, guidance and industry readiness.